1·The mechanism of W-CMP was analyzed, the slurry makes a dual function of chemical erosion and mechanical lapping, has an important influence on the polishing rate.
分析了W - CMP的机理，抛光液对W材料表面具有化学腐蚀和机械研磨的双重作用，对抛光速率有着重要的影响。
2·To tackle the problem in the course of super precise lapping and polishing, the expert system to direct the operation of(super) precising lapping and polishing is designed.
针对超精密研磨和抛光加工过程中出现的问题，设计出指导研磨和抛光加工过程的专家系统。
3·Specifications: Use of non-Buff, Lapping method with greater than 1000mesh felt continuous polishing producing highly reflective product with the same shine as mirror and with no trace of grinding.
规格：使用无BUFF，研磨大于1000 Mesh觉得连续抛光生产与作为镜子，没有一丝光芒一样高反射率的研磨产品的方法。
4·Recommended Applications: Wafer, Optical glass and ceramics lapping, grinding and polishing.
适用范围：适用于硅化、光学玻璃、陶瓷等材料的切割、研磨和抛光。
5·Hyper-fine grinding products and polishing tools can offer better lapping effect on the paint surface, which makes the surface of products have good flatness, smooth finish and comfortable grip.
超精细研磨产品、打磨工具产品，能够提供较高品质的油漆表面研磨效果，使产品表面具有良好的平整度、光洁度、舒适手感。
6·Ideally suited for removing used grinding/lapping/polishing discs with PSA backing from their support discs.
非常适合用于从支持盘上去除自粘连的已研磨/抛光/磨光的盘。